Development of Functional Micro and Nano Structures by Electron Beam Lithography at Institute of Scientific Instruments of Czech Academy of Science

Date: 14 October 2019
Time: 2 – 4 pm
Venue: E6-6-2, Eureka I, Block E6, 5 Engineering Drive 1, Singapore 117608
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As part of E6NanoFab overseas invited speaker series talk, we were pleased to have  Dr. Milan Matejka with us here at E6NanoFab seminar room  in the afternoon on 14 October 2019 to share the current research and development of the Electron Beam Lithography research team working in the Application Laboratories of Micro and Nanotechnology ISI CAS.

His presentation offered insights into the work of his research team, which deals with micro and nano fabrication of optically or physically functional structures.

About the Speaker

Milan Matejka earned his Bachelor’s and Masters Degrees in the Microelectronic and technology and Electrical engineering and management from Brno university of technology in the Czech Republic. Since 2009, he became a member of the research team of Electron Beam Lithography (EBL) in the department of New Technologies at the Institute of Scientific Instruments (IS) of the CAS and finished therein his PhD (An investigation of technological aspects and issues of fabrication deep submicron resolution relief structures by the lithographic process).

Since 2016, Milan has been continuing working as a Post-Doctoral Researcher and EBL technologist at Application Laboratories of Micro and Nanotechnologies of the ISI of CAS, CZ.

In 2019, he became the CEO of IQS nano a leading-edge company developing Micro Optical Devices for LEDs and synthetic holography for Optically Variable Devices (OVDs) with security applications.

His current R&D interests are new technologies of fabrication for micro and nano optic devices (MOD, NOD, MOMS), preparation of highly customized calibration specimens for development of new measurement methodology, additive manufacturing technologies, electron beam lithography and nanoimprint lithography.

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